By Li Panpan
China's lithography equipment manufacturer CFMEE (芯碁微装) said its MAS6 direct writing lithography equipment has recently been sold to the Japanese market, JW Insights reported on November 28.
Based in Hefei of eastern China’s Anhui Province, the firm said the equipment could be used in the digital imaging system of IC packaging substrates production. It adopts DMD technology and can achieve a height resolution of 6μm.
Founded in June 2015 and listed on the Shanghai Stock Exchange in April 2021, CFMEE is one of the few Chinese lithography equipment companies that supply the pan-semiconductor equipment against strong international competition.
Data from Taiwan Printed Circuit Association said the IC substrates have the highest technical requirements, with a minimum line width of 5μm. Japan occupies the forefront of advanced substrates worldwide, guiding the global development direction.
The successful entry of its direct-writing lithography equipment into the Japanese market has proved CFMEE’s competitiveness in the field, JW Insights reported.
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