By Greg Gao

(JW Insights) May 15 -- AMEC(中微公司, Advanced Micro-Fabrication Equipment Inc. China), China’s leading semiconductor equipment maker, recently launched self-developed 12-inch wafer low-pressure chemical vapor deposition (LPCVD) equipment Preforma Uniflex™ CW.

The Preforma Uniflex™ CW can flexibly configure up to five double-reactor chambers (ten reactors), and each chamber can process two wafers simultaneously. While ensuring lower production costs and chemical consumption, it achieves higher production efficiency, said the company.

The system is equipped with an optimized gas mixing scheme and heating table with independent intellectual property rights, which has excellent film uniformity, filling capacity, and process adjustment flexibility. It also has good processing capabilities for wafers with larger curvature. Its step coverage and filling capacity can meet the application requirements for contact holes and tungsten metal wires in advanced logic IC devices, DRAM, and 3D NAND, according to the company.

Founded in 2004, Shanghai-based AMEC has produced outstanding micro-fabrication equipment, which has been adopted by global IC and LED chipmakers. Listed on the Shanghai Stock Exchange STAR Market since July 2019, AMEC has been regarded as shining example of China’s progress in semiconductor equipment.