By Kate Yuan

(JW Insights) Aug 10 -- René Raaijmakers, author of ASML's Architects, said Chinese equipment maker SMEE (上海微电子) may make immersion lithography but will take time to mass production, adding that western commentators underestimated Chinese capabilities in the past on many occasions, he told JW Insights in a recent interview.

Founded in 2002, Shanghai-based SMEE focuses on semiconductor equipment, pan-semiconductor equipment and high-end intelligent equipment for IC front-end, advanced packaging, FPD panels, MEMS, LED and power devices.

Earlier, it was reported that SMEE has been committed to developing a 28nm immersion lithography machine. It's expected the first domestically produced SSA/800-10W lithography machine will be delivered to the market by the end of 2023, according to several mainstream media outlets.

“Maybe they can show immersion in the lab, maybe even double patterning, but I do not think they can produce the overlay at high speed. Even if they show it, the step to mass production will take many years,” he said.

“But I have to admit that western commentators underestimated Chinese capabilities in the past on many occasions,” he added.

Chris Miller, author of Chip War, said that the new Japanese, Dutch, and US export controls will certainly incentivize further government support for SMEE as well as incentivize Chinese firms to consider buying their tools.

However, having to use double or quadruple patterning increases costs and the risk of error, he said, adding that there are many key questions to consider including the yield and software quality.